Electron Microscope

SOLARIS X

A Plasma FIB-SEM platform for deep sectioning and the highest resolution end-pointing for package level failure analysis


SOLARIS X

PRODUCT BROCHURE

SOLARIS X brochure

Extraordinary ultra-high resolution imaging and extremely fast micromachining. Download XEIA3 brochure!

PDF – 6.1 MB

KEY FEATURES

Triglav™ - newly designed UHR electron column

  • - TriLens™ - objective system: unique combination of three-lens objective and crossover-free beam path
  • - Advanced detection system with multiple SE and BSE detectors - TriSE™ and TriBE™
  • - Triglav™ - Ultimate ultra-high resolution at low beam energy: = 0.9 nm at 1 keV and 0.6 nm at 15 keV
  • - Electron beam currents up to 400 nA and rapid beam energy changes
  • - Optimized column geometry for accommodating large wafers up to 8” and 12”

Specification

Electron Optics
Electron GunHigh brightness Schottky emitter
Resolution
Standard mode In-Beam SE

0.6 nm at 15keV
1.2 nm at 1keV

Beam Deceleration Mode

0.9 nm at 1 keV 

Magnification at 30keV4 x - 1,000,000 x
Probe Current2 pA to 400 nA

Extremely powerful Xe plasma FIB column

Xe plasma ion source FIB column for achieving the most challenging large-scale milling tasks in unbeatable short times frames

  • - 50x faster than Ga LMIS FIBs.
  • - on beam range current of 1 pA to 3 µA and resolution of  < 12 nm
  • - Newly developed high resolution Xe plasma FIB column achieving resolution of < 12 nm for extended patterning capabilities
  • - Large-mass xenon ions with larger FIB current range for ultra-fast sputtering even with­out gas-assisted enhancement
  • - Significant reduction in ion implantation compared to Ga LMIS FIBs
  • - Rocking Stage - An effective and optimized polishing strategy against curtaining effect

Ion Optics

Ion column

i-FIB1.5v 


Ion GunXe plasma ion source
Accelerating voltage3kV to 30kV
Probe current

1 pA to 3 µA


Resolution (at 30 keV)

< 12 nm


Magnification

Maximum Field of View

Minimum 150 × at coincidence point and 10 kV (corresponding to 1 mm field of view), maximum 1,000,000 ×
1 mm

SEM-FIB angle

55°




Application

Semiconductors & Microelectronics

Semiconductors & Microelectronics

Material Science

Material Sciences

Life Sciences

Life Sciences

Earth Sciences

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